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Quanta Materials Co., Ltd. is a nano material company that manufactures

  • Gallium oxide powder
  • Tin oxide powder
  • Indium oxide powder

Our oxide nano powders are produced with high temperature evaporator and is a wide specific surface area and has excellent dispersion of lowagglutination(agglomeration). Nanopowder with low size variation, high crystalline and high purity.

The quality of the raw material powder can directly affect the quality of used the target when the oxide target is manufactured by sintered. Our oxide nanopowder is an optimized material for the production of a high-quality oxide sputtering target, especially during bulk (sintered).

These product lines made by physical vapor phase, it helps to ensure the construction homogeneity of oxide target that sintered with high dispersibility and high crystalline can help to achieve reliable sintered density without any non-reactive substances in the wet method.

Also, the oxide powder are highly reactive and responsive to high crystalline allowing it to be applied to sensors, catalyst and other functional materials. We can provide the high technology users can utilize the properties of this powder to provide the homogeneity of optical functional components, such as oxide semiconductors and optical sensors.

V-Ga2O3

Materials to designed to high quality made for IGZO targets, and provide homogenized microstructure.

Application : IGZO target, catalyst, power device wafer

The manufacturing method of the oxide nano powder processes using high-temperature evaporation method that provides better quality than traditional wet methods(low-agglutination, ultra-purified), cost(reduced by more than one-third), and productivity(reduce process time by more than 20%)

BET8~15 ㎡/g

PSD

PSD
D/10 D/50 D/90
Size(㎛) < 0.2 < 0.5 < 1.5

Purity

Purity
content value
Al, As, Bi, Ca, Cd, Co, Cr, CU, Fe, K, Mg,
Mn, Ni, P, Pb, Sb, Si, Sn, Ti, W, Zn, Zr
< 10ppm
Total < 50ppm

Special characteristics

  • Less agglomerate (vapor phase synthesized)
  • High quality of crystallinity
  • 200㎚
  • 100㎚

X-SnO2

Materials to for ITO targets, applicable to ITO target and application with high dispersibility and non-surface ares.

Application : ITO target, catalyst, clarification

Manufactured from oxide nanopowder using high-temperature. Base on homogeneous shape size and quality. It can be applied in a variety of products.

BET8~12 ㎡/g

PSD

PSD
D/10 D/50 D/90
Size(㎛) < 0.2 < 0.5 < 1.5

Purity

Purity
content value
Al, As, Bi, Ca, Cd, Co, Cr, CU, Fe, K, Mg,
Mn, Ni, P, Pb, Sb, Si, Sn, Ti, W, Zn, Zr
< 10ppm
Total < 100ppm

Special characteristics

  • Less agglomerate (vapor phase synthesized)
  • Small size & Narrow size distribution
  • 200㎚
  • 100㎚

R-In2O3

Reduce the occurrence rate of nodule which is one of high density target used, indicates the particle shape and size appropriate for high density target sintered.

Application : ITO target, IGZO target

The method of nano powders oxide using the high temp evaporation method has small aggregates with excellent dispersibility and have a high crystalline. It is optimized oxide nano powder for high quality ITO target productions.

BET8~15 ㎡/g

PSD

PSD
D/10 D/50 D/90
Size(㎛) < 0.2 < 0.5 < 1.5

Purity

Purity
content value
Al, As, Bi, Ca, Cd, Co, Cr, CU, Fe, K, Mg,
Mn, Ni, P, Pb, Sb, Si, Sn, Ti, W, Zn, Zr
< 10ppm
Total < 50ppm

Special characteristics

  • Less agglomerate (vapor phase synthesized)
  • High quality of crystallinity
  • 200㎚
  • 100㎚

process

Vapor Phase Synthesis

  • Lowest cost with high productivity
  • High crystallinity and less agglomerate
  • STEP.01

    Metal droplet

  • STEP.02

    Heat evaporation process

  • STEP.03

    Oxides manufacturing process